sugi:tepla_oxygen_plasma_machine
Differences
This shows you the differences between two versions of the page.
| Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
| sugi:tepla_oxygen_plasma_machine [2014/10/13 12:52] – kaori | sugi:tepla_oxygen_plasma_machine [2024/02/05 11:12] (current) – removed erics | ||
|---|---|---|---|
| Line 1: | Line 1: | ||
| - | =====TePla IoN 3Mz oxygen plasma machine===== | ||
| - | {{ : | ||
| - | |||
| - | Responsible person; Kaori Sugihara\\ | ||
| - | Manufacturer; | ||
| - | {{: | ||
| - | |||
| - | The IoN 3 MHz plasma system is a tabletop plasma chemistry reactor. It is designed to provide repeatable plasma processing for ashing, cleaning or etching. The system is connected to an oxygen supply for oxygen plasma cleaning. | ||
| - | |||
sugi/tepla_oxygen_plasma_machine.1413197572.txt.gz · Last modified: by kaori